TY  - BOOK
AU  - Park,Jea-Gun
AU  - Paik,Ungyu
TI  - Nanoparticle Engineering for Chemical-Mechanical Planarization: Fabrication of Next-Generation Nanodevices 
SN  - 9781420059113
PB  - CRC Press
KW  - Technology & Engineering / Nanotechnology & Mems
KW  - bisacsh
KW  - Technology
KW  - Electronic books
N1  - Access copy available to the general public
N2  - Increasing reliance on electronic devices demands products with high performance and efficiency. Such devices can be realized through the advent of nanoparticle technology. This book explains the physicochemical properties of nanoparticles according to each step in the chemical mechanical planarization (CMP) process, including dielectric CMP, shallow trend isolation CMP, metal CMP, poly isolation CMP, and noble metal CMP. The authors provide a detailed guide to nanoparticle engineering of novel CMP slurry for next-generation nanoscale devices below the 60nm design rule. This comprehensive text also presents design techniques using polymeric additives to improve CMP performance
UR  - https://openresearchlibrary.org/content/d3662c37-f405-4c54-ac91-34b3f72a2396
ER  -