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Strain-Engineered MOSFETs

Maiti, C. K.

Strain-Engineered MOSFETs C. K. Maiti, T. K. Maiti. - 1 online resource (1 p.)

Access copy available to the general public.

This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization.

9781138075603




Technology & Engineering / Electronics / Microelectronics
Technology


Electronic books.

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