Catholic University of Zimbabwe Library
Online Public Access Catalogue
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Strain-Engineered MOSFETs (Record no. 33128)

MARC details
000 -LEADER
fixed length control field 02029nam a22003617a 4500
001 - CONTROL NUMBER
control field 102701
003 - CONTROL NUMBER IDENTIFIER
control field KnowledgeUnlatched
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20210303104949.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS
fixed length control field m o d
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr u||||||||||
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 210129p20122020flu o u00| u eng d
037 ## - SOURCE OF ACQUISITION
Institution to which field applies BiblioBoard
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781138075603
029 1# - OTHER SYSTEM CONTROL NUMBER (OCLC)
OCLC library identifier https://library.biblioboard.com/ext/api/media/152c51d6-f4bf-4cd5-a024-68e55668e9c3/assets/thumbnail.jpg
040 ## - CATALOGING SOURCE
Original cataloging agency ScCtBLL
Transcribing agency ScCtBLL
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Maiti, C. K.
Relator term author.
245 00 - TITLE STATEMENT
Title Strain-Engineered MOSFETs
Statement of responsibility, etc. C. K. Maiti, T. K. Maiti.
264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Name of producer, publisher, distributor, manufacturer CRC Press,
300 ## - PHYSICAL DESCRIPTION
Extent 1 online resource (1 p.)
506 0# - RESTRICTIONS ON ACCESS NOTE
Terms governing access Access copy available to the general public.
Standardized terminology for access restriction Unrestricted
Source of term star
520 ## - SUMMARY, ETC.
Summary, etc. This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization.
588 0# - SOURCE OF DESCRIPTION NOTE
Source of description note Description based on print version record.
590 ## - LOCAL NOTE (RLIN)
Local note KU Select 2018: STEM Backlist Books
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Technology & Engineering / Electronics / Microelectronics
Source of heading or term bisacsh
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Technology
655 #0 - INDEX TERM--GENRE/FORM
Genre/form data or focus term Electronic books.
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Maiti, T. K.
Relator term author.
758 ## -
-- Is found in:
-- Knowledge Unlatched
-- https://openresearchlibrary.org/module/2774bc74-146a-484f-a7ba-ab1d6a09bbfb
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://openresearchlibrary.org/content/152c51d6-f4bf-4cd5-a024-68e55668e9c3">https://openresearchlibrary.org/content/152c51d6-f4bf-4cd5-a024-68e55668e9c3</a>
Public note View this content on Open Research Library.
-- 0
Holdings
Withdrawn status Lost status Source of classification or shelving scheme Damaged status Not for loan Home library Current library Shelving location Date acquired Total Checkouts Date last seen Uniform Resource Identifier Price effective from Koha item type
          Digital Library Digital Library Online Access 03.03.2021   03.03.2021 https://openresearchlibrary.org/content/152c51d6-f4bf-4cd5-a024-68e55668e9c3 03.03.2021 eBook

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